Dr. Sayantan Das
at imec
SPIE Involvement:
Publications (25)

SPIE Journal Paper | 19 October 2023
JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603
KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

SPIE Journal Paper | 1 March 2023
Jens Timo Neumann, Abhilash Srikantha, Philipp Hüthwohl, Keumsil Lee, James William B., Thomas Korb, Eugen Foca, Tomasz Garbowski, Daniel Boecker, Sayantan Das, Sandip Halder
JM3, Vol. 22, Issue 02, 021009, (March 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.021009
KEYWORDS: Defect detection, Education and training, Back end of line, Image restoration, Image classification, Data modeling, Scanning electron microscopy, Process modeling, Machine learning, Electron microscopes

Proceedings Article | 1 December 2022 Poster + Paper
Proceedings Volume 12292, 122920W (2022) https://doi.org/10.1117/12.2645953
KEYWORDS: Photomasks, Optical proximity correction, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Source mask optimization, Manufacturing, Inspection, Signal to noise ratio, Defect inspection

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920Z (2022) https://doi.org/10.1117/12.2645403
KEYWORDS: Scanning electron microscopy, Semiconductors, Data modeling, Photomasks, Metrology, Calibration, Wafer-level optics, Stochastic processes, Shape analysis, Semiconducting wafers

SPIE Journal Paper | 28 October 2022
JM3, Vol. 21, Issue 04, 044901, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.044901
KEYWORDS: Semiconducting wafers, Metals, Critical dimension metrology, Oxides, Scatterometry, Inspection, Stochastic processes, Electron beam lithography, Metrology, Ruthenium

Showing 5 of 25 publications
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