Dr. Sayantan Das
at IMEC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 25 June 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Machine learning, Metrology, Inspection, Process control, Optical lithography, Capacitance, Lithography

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Machine learning, Semiconducting wafers, Capacitance, Resistance, Critical dimension metrology, Etching, Process control, Diffractive optical elements, Oxides, Scatterometry

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Metrology, Extreme ultraviolet lithography, Distortion, Logic, Metals, Extreme ultraviolet, Inspection, Semiconducting wafers

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