Dr. Scott A. Anderson
Senior Process Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Etching, Quartz, Polymers, Ions, Photomasks, Reactive ion etching, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Quartz, Dry etching, Ions, Chemistry, Scanning electron microscopy, Photomasks, Reactive ion etching, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Etching, Quartz, Ions, Chromium, Photomasks, Reactive ion etching, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Phase shifting, Diffractive optical elements, Etching, Quartz, Dry etching, Polymers, Ions, Photomasks, Reactive ion etching, Plasma

PROCEEDINGS ARTICLE | December 19, 2003
Proc. SPIE. 5197, Soft X-Ray Lasers and Applications V
KEYWORDS: Electron beams, X-rays, Laser scattering, Streak cameras, Charge-coupled devices, Picosecond phenomena, X-ray detectors, Pulsed laser operation, Thomson scattering, Hard x-rays

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Statistical analysis, Diffractive optical elements, Etching, Quartz, Ions, Photomasks, Phase measurement, Reactive ion etching, Plasma, Phase shifts

Showing 5 of 9 publications
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