Scott Ashkenaz
Consultant at SMArt
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 June 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Metrology, Manufacturing, Inspection, Process control, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology, Information operations

Proceedings Article | 1 July 1994
Proc. SPIE. 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review
KEYWORDS: Semiconductors, Manufacturing, Control systems, Semiconductor manufacturing

Proceedings Article | 17 May 1994
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Reticles, Lithographic illumination, Image processing, Error analysis, Image resolution, Distortion, Photomasks, Semiconducting wafers, Astatine, Phase shifts

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