Scott Beatty
Senior Applications Development Engineer
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Optimization (mathematics), Metrology, Semiconducting wafers, Statistical methods, Statistical analysis, Time metrology, Overlay metrology, Diffractive optical elements

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