Dr. Scott J. Bukofsky
Senior Engineering Manager at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Diffusion, Manufacturing, Integrated circuits, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Semiconductors, Lithography, Optical lithography, Manufacturing, Control systems, Photomasks, Optical proximity correction, Product engineering, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Diffraction, Phase shifting, Optical lithography, Control systems, Photomasks, Critical dimension metrology, Error control coding, Tolerancing, Phase shifts

SPIE Journal Paper | 1 April 2002
JM3 Vol. 1 Issue 01
KEYWORDS: Photomasks, Optimization (mathematics), Reticles, Diffraction, Wavefronts, Algorithm development, Phase shifts, Tolerancing, Resolution enhancement technologies, Detection and tracking algorithms

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Semiconductors, Signal to noise ratio, Lithography, Capacitors, Manufacturing, Reflectivity, Signal processing, Photomasks, Optical proximity correction, Phase shifts

Showing 5 of 10 publications
Conference Committee Involvement (2)
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
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