Scott Chegwidden
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 2 January 2019 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Extreme ultraviolet lithography, Imaging systems, Semiconducting wafers, Particles, Scanners, Contamination, Manufacturing

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Photomasks, Deep ultraviolet, Semiconducting wafers, Atomic force microscopy, Ion beams, Phase shifts, Floods, Printing, Scanners

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Ruthenium, Etching, Reflectivity, Silicon, Photomasks, Extreme ultraviolet lithography, Optical lithography, Oxides, Extreme ultraviolet, Electron beam lithography

Proceedings Article | 18 December 1998 Paper
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Etching, Plasma etching, Plasma, Chromium, Photomasks, Critical dimension metrology, Standards development, Metals, Reactive ion etching, Diffractive optical elements

Showing 5 of 6 publications
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