Scott Goad
Process Engineer at Advanced Micro Devices Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72750U (2009) https://doi.org/10.1117/12.813522
KEYWORDS: Optical proximity correction, Photomasks, Computer simulations, Etching, Resolution enhancement technologies, Lithography, Statistical modeling, SRAF, Computer hardware, Optical lithography

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712234 (2008) https://doi.org/10.1117/12.801239
KEYWORDS: Reticles, Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Lithography, Modulation, Logic, Calibration, Product engineering

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544
KEYWORDS: Optical resolution, Optical components, Resolution enhancement technologies, Data processing, Control systems, Photomasks, Metals, Data centers, Optical proximity correction, Databases

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986
KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

Proceedings Article | 21 June 2006 Paper
Proceedings Volume 6281, 62810H (2006) https://doi.org/10.1117/12.692639
KEYWORDS: Optical proximity correction, Photomasks, Vestigial sideband modulation, Logic, SRAF, Reticles, Resolution enhancement technologies, Manufacturing, Metals, Data storage

Showing 5 of 6 publications
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