Dr. Scott Halle
at IBM Corp
SPIE Involvement:
Author
Publications (46)

SPIE Journal Paper | 12 October 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Proceedings Article | 19 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Defect detection, Inspection, Optical inspection, Nonlinear optics, Wafer inspection, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical filters, Metrology, Optical lithography, Sensors, Image segmentation, Inspection, Reflectivity, Scatterometry, Solids, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Multilayers, Deep ultraviolet, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 6 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Defect detection, Opacity, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Image classification, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Showing 5 of 46 publications
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