Dr. Scott D. Hector
Mask Strategy Program Manager at
SPIE Involvement:
Conference Program Committee | Author
Publications (48)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Metrology, Manufacturing, Photomasks, Integrated circuits, Semiconducting wafers, Yield improvement, Phase shifts, Defect inspection

Proceedings Article | 27 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Manufacturing, Photomasks, Extreme ultraviolet, Beam shaping, Optical proximity correction, Mask making, Manufacturing equipment, Yield improvement, Binary data

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Manufacturing, Pellicles, Printing, Data processing, Microelectronics, Photomasks, Optical proximity correction, Data conversion, Binary data

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Inspection, Photomasks, Extreme ultraviolet, Mask making, Resolution enhancement technologies, Instrument modeling, Defect inspection

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Databases, Glasses, Manufacturing, Data processing, Microelectronics, Photomasks, Semiconductor manufacturing, Binary data, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Polarization, Sensors, Polarizers, Attenuators, Photomasks, Laser beam diagnostics, Binary data, Phase shifts, Diffraction gratings

Showing 5 of 48 publications
Conference Committee Involvement (7)
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Optical Microlithography XIX
21 February 2006 | San Jose, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask Technology
14 September 2004 | Monterey, California, United States
Showing 5 of 7 published special sections
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