Mr. Scott L. Light
Engineer at Micron Technology Inc
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Electronics, Optical lithography, Etching, Dry etching, Image processing, Materials processing, Photoresist materials, Atomic layer deposition, Plasma etching, Photomicroscopy, Thin film coatings, Semiconducting wafers, Photoresist developing, Plasma

PROCEEDINGS ARTICLE | March 27, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Cadmium, Etching, Polymers, Glasses, Silicon, Scanning electron microscopy, Line width roughness, Directed self assembly, Reactive ion etching

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Cadmium, Etching, Dry etching, Polymers, Silicon, Scanning electron microscopy, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Carbon, Optical lithography, Etching, Dry etching, Inspection, Scanning electron microscopy, Line width roughness, Directed self assembly, Cadmium sulfide, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Thin films, Diffraction, Reflection, Sensors, Scanners, Manufacturing, Spatial light modulators, Optical alignment, Semiconducting wafers, Signal detection

Showing 5 of 12 publications
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