Mr. Scott Pomeroy Profile

Scott Pomeroy

Applications Manager at KLA Texas

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 3 May 2007 Paper

Production evaluation of automated reticle defect printability prediction application

William Howard, Scott Pomeroy, Raphael Moses, Thomas Thaler

Proceedings Volume 6533, 65330A (2007) https://doi.org/10.1117/12.736495

KEYWORDS: Reticles, Inspection, Photomasks, Lithography, Critical dimension metrology, Manufacturing, Systems modeling, Semiconducting wafers, Binary data, Metrology

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Proceedings Article | 11 March 2002 Paper

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology

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Proceedings Article | 22 January 2001 Paper

Evaluation of a multiple-beam defect inspection platform using an integrated reference mask

Jerry Chen, Franklin Kalk, Anthony Vacca, Scott Pomeroy, Jordan Carroll

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410744

KEYWORDS: Inspection, Photomasks, Reticles, Optical proximity correction, Defect inspection, Standards development, Ultraviolet radiation, Computing systems, Defect detection, Detection and tracking algorithms

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Proceedings Article | 3 February 2000 Paper

Improving reticle yields with after develop inspection (ADI)

Franklin Kalk, Keith Brankner, Laurie Peters, Anthony Vacca, Scott Pomeroy, David Emery

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377117

KEYWORDS: Inspection, Chromium, Etching, Dry etching, Scanning electron microscopy, Photomasks, Modulation, Reflectivity, Wet etching, Detection and tracking algorithms

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Proceedings Article | 30 December 1999 Paper

Dry etch yield enhancement by use of after-develop inspection

Franklin Kalk, Keith Brankner, Lori Peters, Anthony Vacca, Scott Pomeroy, David Emery

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373306

KEYWORDS: Etching, Inspection, Chromium, Dry etching, Photomasks, Modulation, Reflectivity, Wet etching, Detection and tracking algorithms, Scanning electron microscopy

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