Dr. Se-Hyuk Im
at Canon Nanotechnologies, Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2020
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Distortion, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical alignment, Ultraviolet radiation, Overlay metrology, Wafer testing, Semiconductors

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Optical lithography, Nanoimprint lithography, Stochastic processes, Semiconductor manufacturing, Particles, Semiconducting wafers, Lithography, Manufacturing equipment, Capillaries

Proceedings Article | 16 May 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Nanoimprint lithography, Overlay metrology, Optical alignment, Ultraviolet radiation, Data modeling, Semiconductors, Capillaries

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