Continuous Roll-to-Roll NanoImprint Lithography (R2RNIL) provides greatly improved throughput by overcoming the
challenges faced by conventional NIL in maintaining pressure uniformity and successful large-area imprinting and
demolding. We present continuous imprinting of nanoscale structures with linewidth down to 70nm on a flexible plastic
substrate. Our new process used a flexible and non-sticking fluoropolymer mold, and fast thermal and UV curable liquid
resist materials. In addition, pattern quality in continuous R2RNIL process according to two different mold-separation
directions has been analytically investigated.