Mr. Se-Jin Park
Manager at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Logic, Optical lithography, Databases, Metals, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Logic, Lithographic illumination, Metals, Scanners, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Deep ultraviolet, Scanners, Photomasks, Critical dimension metrology, Semiconducting wafers, Laser systems engineering, Back end of line

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Reticles, Optical lithography, Cadmium, Electroluminescence, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Data modeling, Etching, Error analysis, Electroluminescence, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Oxides, Electronics, Polishing, Etching, Sputter deposition, Metals, Semiconducting wafers, Signal detection, Overlay metrology, Chemical mechanical planarization

Showing 5 of 6 publications
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