Dr. Sean D. Burns
Manager, Design Technology and Innovation at IBM Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 17 April 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Logic, Optical lithography, Data modeling, Deep ultraviolet, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Optics manufacturing, Yield improvement

Proceedings Article | 13 April 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Metals, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Image processing, Silicon, Directed self assembly, Line edge roughness, Neodymium

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Oxides, Lithography, Polymethylmethacrylate, Etching, Image processing, Silicon, Scanning electron microscopy, Atomic layer deposition, Directed self assembly

Showing 5 of 30 publications
Conference Committee Involvement (13)
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXI
24 February 2014 | San Jose, California, United States
Showing 5 of 13 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top