Dr. Sean Kerr Eichenlaub
at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Silica, Particles, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Vacuum ultraviolet, Ruthenium

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Optical spheres, Defect detection, Quartz, Glasses, Particles, Inspection, Atomic force microscopy, Extreme ultraviolet, Surface finishing, Chemical mechanical planarization

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Etching, Quartz, Glasses, Particles, Surface roughness, Photomasks, Extreme ultraviolet, Deposition processes, Anisotropic etching, Chemical mechanical planarization

Proceedings Article | 1 April 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Quartz, Glasses, Particles, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Cavitation, Acoustics, Surface finishing

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Quartz, Particles, Ions, Chemistry, Photomasks, Extreme ultraviolet lithography, Scanning probe microscopy, Vacuum ultraviolet, Mask cleaning, Liquids

Showing 5 of 14 publications
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