Mr. Sean Hannon
at Spansion Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Manufacturing, Data processing, Photomasks, Source mask optimization, Optical proximity correction, Optical alignment, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Nano opto mechanical systems, Data modeling, Scanners, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Standards development

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Statistical analysis, Metals, Image processing, Diagnostics, Process control, Semiconducting wafers, Overlay metrology, Process modeling, Visibility

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