Mr. Sebastian Geisler
at
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Author
Publications (4)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Sensors, Photomasks, Double patterning technology, Optical alignment, Critical dimension metrology, Neodymium, Semiconducting wafers, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Etching, Metals, Distortion, Scanning electron microscopy, Photomasks, Transistors, Optical proximity correction, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | April 11, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Superposition, Lithography, Lithographic illumination, Ultraviolet radiation, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Binary data, Stereolithography

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