Sebastian Haumann
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Standards development, Scanning electron microscopy, Photoresist processing, Photonics, Optical lithography, Nanotechnology, Metrology, Lithography

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