Dr. Sebastian Heidenreich
at Physikalisch Technische Bundesanstalt
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | 5 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Scattering, X-rays, Inverse problems, Finite element methods

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Oxides, Data modeling, Polarization, Silicon, Scatterometry, Inverse problems, Photomasks, Scatter measurement, Systems modeling, Chaos

Proceedings Article | 20 August 2015
Proc. SPIE. 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII
KEYWORDS: Metrology, Calibration, X-rays, Silicon, Manufacturing, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Standards development

Proceedings Article | 21 June 2015
Proc. SPIE. 9526, Modeling Aspects in Optical Metrology V
KEYWORDS: Metrology, Atomic force microscopy, Scatterometry, Inverse problems, Finite element methods, Photomasks, Scatter measurement, Inverse optics, Chaos, Bayesian inference

Showing 5 of 9 publications
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