Sebastian F. Munoz
at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Roads, Statistical analysis, Sensors, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Vestigial sideband modulation, Data analysis

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