Dr. Sebastian W. Schmidt
at nanotools GmbH
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Neck, Metrology, Image processing, Silicon, Image analysis, Atomic force microscopy, Scanning electron microscopy, Process control, Critical dimension metrology, Algorithm development

PROCEEDINGS ARTICLE | May 17, 2013
Proc. SPIE. 8763, Smart Sensors, Actuators, and MEMS VI
KEYWORDS: Microelectromechanical systems, Nanostructures, Electron beams, Silicon, Inspection, Atomic force microscopy, Scanning electron microscopy, Nanoelectromechanical systems, Californium, Nanolithography

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Electron beams, Silica, Silicon, Manufacturing, Inspection, Atomic force microscopy, Directed self assembly, Critical dimension metrology

PROCEEDINGS ARTICLE | April 6, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Carbon, Electron beams, Silicon, Manufacturing, Atomic force microscopy, Scanning electron microscopy, Process control, Silicon carbide, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Oxides, Carbon, Electron beams, Metals, Manufacturing, Scanning electron microscopy, Neon, Critical dimension metrology, Californium, Carbon nanotubes

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