Dr. Sébastien Soulan
at CEA-LETI
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 13 May 2013 Paper
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Lithography, Diffraction, Refractive index, Metrology, Data modeling, Scatterometry, Inverse problems, Process control, Neural networks, Optimization (mathematics)

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Logic, Optical lithography, Scanning electron microscopy, Photomasks, Double patterning technology, Neodymium, Semiconducting wafers, Optics manufacturing

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Logic, Optical lithography, Data modeling, Modulation, Metals, Electroluminescence, Maskless lithography, Semiconducting wafers

Proceedings Article | 4 April 2011 Paper
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Electron beam lithography, Point spread functions, Modulation, Calibration, Printing, Monte Carlo methods, Optical proximity correction, Line edge roughness, Semiconducting wafers, Projection lithography

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Thin films, Refractive index, Metrology, Optical lithography, Polymers, Spectroscopy, Inspection, Process control, Polymer thin films, Current controlled current source

Showing 5 of 7 publications
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