In this paper we present a technology for wall shear stress and pressure integrated sensor fabrication. Thanks to the use of SOI wafers and wafer bonding technique, we came up with an innovative technology that provides high on-chip density of sensors required for arrays utilized in numerous microfluidic applications like active control of flow. At the end some wall shear stress results are presented.
The effect of the electric double layer (EDL) on the linear stability of Poiseuille planar channel flow is reported. It is shown that the EDL destabilizes the linear modes, and that the critical Reynolds number decreases significantly when the thickness of the double layer becomes comparable with the height of the channel. The planar macro scale Poiseuille flow is metastable, and the inflexional EDL instability may further decrease the macro-transitional Reynolds number. There is a good correspondence between the estimated transitional Reynolds numbers and some experiments, showing that early transition is plausible in microchannels under some conditions.