Mr. Seejun Jeong
at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 18, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Microscopes, Diffraction, Scattering, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Binary data, Phase shifts

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Molybdenum, Stochastic processes, Phase shifts

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top