Dr. SehJin Park
at Intel Corp
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Scattering, Sensors, Light scattering, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Phase measurement, Phase shifts

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Defect detection, Silica, Quartz, Particles, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Photovoltaics, Reticles, Data modeling, Error analysis, Distortion, Image registration, Finite element methods, Photomasks, Extreme ultraviolet

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Multilayers, Metrology, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Defect inspection

Showing 5 of 9 publications
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