Dr. SehJin Park
at Intel Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Scattering, Sensors, Light scattering, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Phase measurement, Phase shifts

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Defect detection, Silica, Quartz, Particles, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Photovoltaics, Reticles, Data modeling, Error analysis, Distortion, Image registration, Finite element methods, Photomasks, Extreme ultraviolet

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

Showing 5 of 9 publications
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