Dr. SehJin Park
at Intel Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Extreme ultraviolet, Phase measurement, Photomasks, Reflectivity, Phase shifts, Scattering, Data modeling, Reflectometry, Light scattering, Sensors

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top