Mr. Seiichi Ishikawa Profile

Seiichi Ishikawa

at e-Shuttle Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 20 March 2006 Paper

Paper

Optimization of contact hole lithography for 65-nm node logic LSI

Yuji Setta, Hiroki Futatsuya, Atsushi Sagisaka, Tatsuo Chijimatsu, Takayoshi Minami, Fumitoshi Sugimoto, Seiichi Ishikawa, Satoru Asai

Proceedings Volume 6154, 61543T (2006) https://doi.org/10.1117/12.656224

KEYWORDS: SRAF, Lithographic illumination, Lithography, Fiber optic illuminators, Logic, Optical lithography, Photomasks, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies

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Proceedings Article | 12 June 2003 Paper

Paper

F2 resist outgassing studied by in situ QCM technique

Masamitsu Shirai, Toyofumi Shinozuka, Masahiro Tsunooka, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485090

KEYWORDS: Polymers, Crystals, Quartz, Absorption, FT-IR spectroscopy, Polymethylmethacrylate, Vacuum ultraviolet, Lamps, Excimers, Infrared spectroscopy

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Proceedings Article | 12 June 2003 Paper

Paper

Dependence of outgassing characters and total amount of outgassed species at 157-nm exposure on the structures of resist base polymer

Yoshinori Matsui, Satoshi Umeda, Shiro Matsui, Shu Seki, Seiichi Tagawa, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485200

KEYWORDS: Polymers, Polymer thin films, Ions, Spectroscopy, Fluorine, Hydrogen, Contamination, Transparency, Silicon, Polymethylmethacrylate

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Proceedings Article | 12 June 2003 Paper

Paper

Study of resist outgassing by F2 laser irradiation

Yasuo Itakura, Youichi Kawasa, Akira Sumitani, Seiichi Ishikawa, Shigeo Irie, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485087

KEYWORDS: Fluorine, Contamination, Transmittance, Laser irradiation, Lithography, Absorbance, Semiconducting wafers, Pulsed laser operation, Laser development, Molecules

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Proceedings Article | 12 June 2003 Paper

Paper

Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Yasuhide Kawaguchi, Jun Irisawa, Shun-ichi Kodama, Shinji Okada, Yoko Takebe, Isamu Kaneko, Osamu Yokokoji, Seiichi Ishikawa, Shigeo Irie, Takuya Hagiwara, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483735

KEYWORDS: Polymers, Resistance, Etching, Chemical species, Fluorine, Transparency, Absorption, Lithography, Semiconducting wafers, Gases

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Proceedings Article | 12 June 2003 Paper

Paper

Performances of resists for 157-nm lithography based on monocyclic fluoropolymers

Seiichi Ishikawa, Shigeo Irie, Toshiro Itani, Yasuhide Kawaguchi, Osamu Yokokoji, Shun-ichi Kodama

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485051

KEYWORDS: Polymers, Lithography, Absorption, Resistance, Fluorine, Photomasks, Transparency, Polymer thin films, Silicon, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

Paper

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji Okada, Yasuhide Kawaguchi, Naomi Shida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474160

KEYWORDS: Polymers, Polymerization, Glasses, Transparency, Photoresist materials, Lithography, Phase shifts, Photomasks, Manganese, Fluorine

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Proceedings Article | 24 July 2002 Paper

Paper

157-nm single-layer resists based on advanced fluorinated polymers

Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474247

KEYWORDS: Polymers, Transparency, Standards development, Lithography, Etching, Fluorine, Vacuum ultraviolet, Dry etching, Reactive ion etching, Absorbance

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Proceedings Article | 24 July 2002 Paper

Paper

Fluoropolymer resists for 157-nm lithography

Minoru Toriumi, Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474218

KEYWORDS: Polymers, Absorption, Lithography, Fluorine, Etching, Resistance, Transparency, Chemical species, Transmittance, Photomasks

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Proceedings Article | 24 August 2001 Paper

Paper

Resist materials for 157-nm lithography

Minoru Toriumi, Seiichi Ishikawa, Seiro Miyoshi, Takuya Naito, Tamio Yamazaki, Manabu Watanabe, Toshiro Itani

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436868

KEYWORDS: Polymers, Absorption, Lithography, Etching, Standards development, Resistance, Photoresist materials, Transparency, Fluorine, Transmittance

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Showing 5 of 10 publications

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