Seiichi Ishikawa
at e-Shuttle Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Photomasks, SRAF, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Gases, Resistance, Fluorine, Semiconducting wafers, Absorption

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: FT-IR spectroscopy, Polymethylmethacrylate, Quartz, Polymers, Crystals, Lamps, Infrared spectroscopy, Excimers, Vacuum ultraviolet, Absorption

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Polymers, Silicon, Resistance, Photomasks, Fluorine, Semiconducting wafers, Polymer thin films, Absorption

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Contamination, Molecules, Laser development, Laser irradiation, Transmittance, Absorbance, Fluorine, Semiconducting wafers, Pulsed laser operation

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Transparency, Contamination, Polymethylmethacrylate, Polymers, Spectroscopy, Ions, Silicon, Hydrogen, Fluorine, Polymer thin films

Showing 5 of 10 publications
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