Prof. Seiichi Tagawa
Professor Emeritus at
SPIE Involvement:
Author
Publications (65)

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Electron beams, Nanoparticles, Polymers, Metals, Ions, Silver, Absorbance, Picosecond phenomena, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Light sources, Polymers, Ultraviolet radiation, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Picosecond phenomena, Line edge roughness, Floods, Industrial chemicals, Absorption, Chemically amplified resists

SPIE Journal Paper | July 15, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

Showing 5 of 65 publications
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