Seiji Matsuura
at DNP Fine Electronics Sagamihara Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Light sources, Lithographic illumination, Etching, Scanners, Scanning electron microscopy, Line width roughness, Optical alignment, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Nanoimprint lithography, Fluorine, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Refractive index, Optical lithography, Lithographic illumination, Polarization, Scanners, Scanning electron microscopy, Photomasks, Immersion lithography, Absorption

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Target detection, Lithography, Monochromatic aberrations, Optical transfer functions, Point spread functions, Imaging systems, Fourier transforms, Wavefronts, Zernike polynomials, Spherical lenses

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Fabrication, Semiconductors, Lithography, Lithographic illumination, Transmittance, Photomasks, Nanoimprint lithography, Line edge roughness, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Quartz, Image resolution, Chromium, Photomasks, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 12 publications
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