Prof. Seiji Samukawa
at Tohoku Univ
SPIE Involvement:
Conference Program Committee | Author
Publications (6)

Proceedings Article | 17 November 2016
Proc. SPIE. 10027, Nanophotonics and Micro/Nano Optics III
KEYWORDS: Iron, Etching, Luminescence, Germanium, Ions, Gallium arsenide, Silicon, Nanolithography, Plasma, Nanowires

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Argon, Gases, Magnetism, Transition metals, Platinum, Reactive ion etching, Plasma generation, Semiconducting wafers, Plasma

Proceedings Article | 28 March 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Chemical species, Annealing, Copper, Silicon, Diffusion, Chemical vapor deposition, Oxygen, Silicon films, Plasma enhanced chemical vapor deposition, Plasma

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Etching, Polymers, Surface roughness, Photoresist materials, Plasma etching, Chemical analysis, Chemical reactions, Chlorine, Polymer thin films, Plasma

Proceedings Article | 16 March 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Carbon, Etching, Ultraviolet radiation, Ions, Silicon, Photoresist materials, Field effect transistors, Plasma etching, Chlorine, Plasma

Showing 5 of 6 publications
Conference Committee Involvement (6)
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning III
24 February 2014 | San Jose, California, United States
Showing 5 of 6 published special sections
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