Seiji Takeuchi
at Canon U.S.A., Inc.
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 15 February 2017
Proc. SPIE. 10040, Endoscopic Microscopy XII
KEYWORDS: Endoscopy, Optical components, Diffraction, Optical design, Reflection, Surgery, Imaging systems, Spectroscopy, Endoscopes, Image processing software, Neodymium, Diffraction gratings

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Image resolution, Interferometry, Photoresist materials, Optical simulations, Immersion lithography, Modulation transfer functions

Proceedings Article | 22 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Monochromatic aberrations, Visible radiation, Polarization, Interferometers, Calibration, Wavefronts, Optical testing, Zernike polynomials, Extreme ultraviolet lithography, Near field optics

Proceedings Article | 18 August 2005
Proc. SPIE. 5869, Optical Manufacturing and Testing VI
KEYWORDS: Monochromatic aberrations, Mirrors, Metrology, Polarization, Cameras, Calibration, Silicon, Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography

Proceedings Article | 18 August 2005
Proc. SPIE. 5869, Optical Manufacturing and Testing VI
KEYWORDS: Mirrors, Interferometers, Calibration, Interferometry, Wavefronts, Phase interferometry, Optical testing, CCD cameras, Extreme ultraviolet lithography, Spherical lenses

Showing 5 of 10 publications
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