Seima Kato
at Canon Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Mirrors, Interferometers, Wavefronts, Optical testing, Projection systems, Extreme ultraviolet, Optics manufacturing, EUV optics, Wavefront metrology, Diffusion tensor imaging

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Diffraction, Mirrors, Wavefronts, Optical testing, CCD cameras, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Diffraction gratings

PROCEEDINGS ARTICLE | September 17, 2005
Proc. SPIE. 5921, Advances in Metrology for X-Ray and EUV Optics
KEYWORDS: Diffraction, Metrology, Interferometers, Wavefronts, Optical testing, Extreme ultraviolet, Charge-coupled devices, EUV optics, Shearing interferometers, Diffusion tensor imaging

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Diffraction, Monochromatic aberrations, Interferometers, Wavefronts, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Diffraction gratings, Shearing interferometers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Diffraction, Monochromatic aberrations, Light sources, Interferometers, Calibration, Wavefronts, Extreme ultraviolet lithography, EUV optics, Diffraction gratings, Shearing interferometers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Diffraction, Monochromatic aberrations, Interferometers, Calibration, Wavefronts, Optical testing, Extreme ultraviolet, Charge-coupled devices, Phase shifts, Diffraction gratings

Showing 5 of 9 publications
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