Dr. Seiro Miyoshi Profile

Dr. Seiro Miyoshi

at Toshiba Corp

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 15 March 2016 Paper

Paper

Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Ken Furubayashi, Koutarou Sho, Seiro Miyoshi, Shinji Yamaguchi, Kazunori Iida, Satoshi Usui, Tsuyoshi Morisaki, Naoki Sato, Hidefumi Mukai

Proceedings Volume 9780, 97800O (2016) https://doi.org/10.1117/12.2218416

KEYWORDS: Photomasks, Optical lithography, Lithography, Double patterning technology, Scanners, Semiconducting wafers, Reactive ion etching, Metals, Semiconductors, Lenses, Opacity, Etching, Critical dimension metrology, Anisotropic etching, Photoresist materials

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Proceedings Article | 5 April 2012 Paper

Paper

Novel prediction methodology for etched hole patterning failure

Seiro Miyoshi, Hideaki Abe, Kazuhiro Takahata, Tomoko Ojima, Masanari Kajiwara, Shoji Mimotogi, Kohji Hashimoto

Proceedings Volume 8324, 83241J (2012) https://doi.org/10.1117/12.916029

KEYWORDS: Optical lithography, Critical dimension metrology, Failure analysis, Lithography, Finite element methods, Process control, Photoresist processing, Reactive ion etching, Data modeling, Optimization (mathematics)

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Proceedings Article | 11 December 2009 Paper

Paper

Mask defect specification in the spacer patterning process by using a fail-bit-map analysis

Seiro Miyoshi, Shinji Yamaguchi, Masato Naka, Keiko Morishita, Takashi Hirano, Hiroyuki Morinaga, Hiromitsu Mashita, Ayumi Kobiki, Makoto Kaneko, Hidefumi Mukai, Minori Kajimoto, Takashi Sugihara, Yoshiyuki Horii, Yoshihiro Yanai, Tadahito Fujisawa, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7520, 752014 (2009) https://doi.org/10.1117/12.837132

KEYWORDS: Photomasks, Opacity, Semiconducting wafers, Optical lithography, Etching, Failure analysis, Photoresist materials, Photoresist developing, Lithography, Critical dimension metrology

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SPIE Journal Paper | 1 January 2009

Novel lithography design and verification methodology with patterning failure

Seiro Miyoshi, Yuuji Kobayashi, Satoshi Tanaka, Kenji Kawano, Koji Hashimoto, Soichi Inoue

JM3, Vol. 8, Issue 01, 013004, (January 2009) https://doi.org/10.1117/12.10.1117/1.3079782

KEYWORDS: Data modeling, Line width roughness, Critical dimension metrology, Nanoimprint lithography, Lithography, Process modeling, Optical lithography, Lithographic illumination, Semiconducting wafers, Inspection

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Proceedings Article | 4 December 2008 Paper

Paper

A novel lithography design and verification methodology with patterning failure

Seiro Miyoshi, Yuuji Kobayashi, Satoshi Tanaka, Kenji Kawano, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7140, 714011 (2008) https://doi.org/10.1117/12.804638

KEYWORDS: Data modeling, Line width roughness, Nanoimprint lithography, Critical dimension metrology, Lithography, Process modeling, Optical lithography, Lithographic illumination, Inspection, Semiconducting wafers

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Proceedings Article | 4 December 2008 Paper

Paper

Mask specification guidelines in spacer patterning technology

Kohji Hashimoto, Hidefumi Mukai, Seiro Miyoshi, Shinji Yamaguchi, Hiromitsu Mashita, Yuuji Kobayashi, Kenji Kawano, Takashi Hirano

Proceedings Volume 7140, 714022 (2008) https://doi.org/10.1117/12.804744

KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Line width roughness, Lithography, Opacity, Etching, Photoresist processing, Materials processing, Double patterning technology

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Proceedings Article | 17 October 2008 Paper

Paper

Mask defect printability in the spacer patterning process

Seiro Miyoshi, Shinji Yamaguchi, Takashi Hirano, Hiromitsu Mashita, Hidefumi Mukai, Ayumi Kobiki, Yuuji Kobayashi, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7122, 71220P (2008) https://doi.org/10.1117/12.801410

KEYWORDS: Photomasks, Etching, Optical lithography, Opacity, Photoresist materials, Semiconducting wafers, Line width roughness, Photoresist developing, Critical dimension metrology, Lithography

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Proceedings Article | 26 March 2008 Paper

Paper

Sub-45nm resist process using stacked-mask process

Yuriko Seino, Katsutoshi Kobayashi, Koutaro Sho, Hirokazu Kato, Seiro Miyoshi, Keisuke Kikutani, Junko Abe, Hisataka Hayashi, Tokuhisa Ohiwa, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 6923, 69232O (2008) https://doi.org/10.1117/12.771840

KEYWORDS: System on a chip, Etching, Reactive ion etching, Reflectivity, Hydrogen, Fluorine, Lithography, Photoresist processing, Silica, Scanning electron microscopy

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Proceedings Article | 26 June 2003 Paper

Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Optical proximity correction, Lithography, Transmittance, Photoresist processing, Resolution enhancement technologies, Silicon, Reactive ion etching, Photomasks, Monochromatic aberrations, Optical simulations

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Proceedings Article | 26 June 2003 Paper

Paper

Development of an organic bottom antireflective coating for 157-nm lithography

Shigeo Irie, Masato Shigematsu, Seiro Miyoshi, Rikimaru Sakamoto, Kenichi Mizusawa, Yasuyuki Nakajima, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485369

KEYWORDS: Polymers, Lithography, Refractive index, Etching, Chromophores, Reflection, Polymer thin films, Bottom antireflective coatings, Photorefractive polymers, Fluorine

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Proceedings Article | 12 June 2003 Paper

Paper

Critical dimension (CD) control in 157-nm lithography

Shinya Hori, Kosuke Yoshihara, Hideharu Kyoda, Hidefumi Matsui, Takamitsu Furukawa, Seiro Miyoshi, Etsurou Kawaguchi, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485057

KEYWORDS: Critical dimension metrology, Photoresist processing, Coating, Lithography, Line edge roughness, Fluorine, Control systems, Contamination, Polymers, Semiconducting wafers

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Proceedings Article | 12 June 2003 Paper

Paper

Feasibility study of defects in 157-nm resist process

Shinya Wakamizu, Yukio Kiba, Etsurou Kawaguchi, Seiro Miyoshi, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485053

KEYWORDS: Nitrogen, Polymers, Fluorine, Chemical species, Photoresist processing, Light sources, Transmittance, Deep ultraviolet, 193nm lithography, Lithography

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Proceedings Article | 12 June 2003 Paper

Paper

157-nm bilayer resist: patterning and etching performance

Seiro Miyoshi, Takamitsu Furukawa, Etsurou Kawaguchi, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483769

KEYWORDS: Reactive ion etching, Transmittance, Etching, Photoresist processing, Fluorine, Lithography, Photomasks, Silicon, Optical lithography, Transparency

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SPIE Journal Paper | 1 October 2002

Pattern transfer processes for 157-nm lithography

Seiro Miyoshi, Takamitsu Furukawa, Hiroyuki Watanabe, Shigeo Irie, Toshiro Itani

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507336

KEYWORDS: Reactive ion etching, Silicon, Photoresist processing, Lithography, Fluorine, Reflectivity, Interfaces, Photomasks, Optical lithography, Etching

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SPIE Journal Paper | 1 October 2002

157 nm lithography with high numerical aperture lens for the 70 nm technology node

Toshifumi Suganaga, Noriyoshi Kanda, Jae-Hwan Kim, Osamu Yamabe, Kunio Watanabe, Takamitsu Furukawa, Seiro Miyoshi, Toshiro Itani, Julian Cashmore, Malcolm Gower

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1501565

KEYWORDS: Birefringence, Lithography, Monochromatic aberrations, Semiconducting wafers, Imaging systems, Resolution enhancement technologies, Reticles, Wavefronts, Photomasks, Computer aided design

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Proceedings Article | 30 July 2002 Paper

Paper

157-nm lithography with high numerical aperture lens for 70-nm technology node

Toshifumi Suganaga, Noriyoshi Kanda, J. Kim, Osamu Yamabe, Kunio Watanabe, Takamitsu Furukawa, Seiro Miyoshi, Toshiro Itani, Julian Cashmore, Malcolm Gower

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474606

KEYWORDS: Birefringence, Imaging systems, Resolution enhancement technologies, Monochromatic aberrations, Lithography, Silicon, Semiconducting wafers, Crystals, Interferometry, Photomasks

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Proceedings Article | 24 July 2002 Paper

Paper

Pattern transfer processes for 157-nm lithography

Seiro Miyoshi, Takamitsu Furukawa, Hiroyuki Watanabe, Shigeo Irie, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474221

KEYWORDS: Reactive ion etching, Photoresist processing, Silicon, Lithography, Reflectivity, Etching, Optical lithography, Interfaces, Photomasks, Absorption

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Proceedings Article | 16 July 2002 Paper

Paper

Defect analysis in 157-nm photolithography process

Yukio Kiba, Shinya Hori, Osamu Miyahara, Yuko Ono, Junichi Kitano, Seiro Miyoshi, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473505

KEYWORDS: Optical lithography, Lithography, Satellites, Coating, Semiconductors, Chemically amplified resists, Semiconducting wafers, Polymers, Thin films, Metrology

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Proceedings Article | 16 July 2002 Paper

Paper

Environmental control for lithography with 157-nm exposure

Junichi Kitano, Yukio Kiba, Kouichiro Inazawa, Seiro Miyoshi, Hiroyuki Watanabe, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473417

KEYWORDS: Photoresist processing, Etching, Adsorption, Lithography, Semiconducting wafers, Contamination, Dry etching, Semiconductors, Chemically amplified resists, Process control

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Proceedings Article | 24 August 2001 Paper

Paper

Resist materials for 157-nm lithography

Minoru Toriumi, Seiichi Ishikawa, Seiro Miyoshi, Takuya Naito, Tamio Yamazaki, Manabu Watanabe, Toshiro Itani

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436868

KEYWORDS: Polymers, Absorption, Lithography, Etching, Standards development, Resistance, Photoresist materials, Transparency, Fluorine, Transmittance

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Proceedings Article | 11 June 1999 Paper

Paper

Application of polysilanes for deep-UV antireflective coating

Yasunobu Onishi, Yasuhiko Sato, Eishi Shiobara, Seiro Miyoshi, Hideto Matsuyama, Junko Abe, Hideo Ichinose, Tokuhisa Ohiwa, Yoshihiko Nakano, Sawako Yoshikawa, Shuzi Hayase

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350203

KEYWORDS: Etching, Deep ultraviolet, Dielectrics, Coating, Interfaces, Refractive index, Antireflective coatings, Photoresist materials, Reflectivity, Reflection

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Proceedings Article | 1 December 1990 Paper

Paper

Frequency doubling of laser diode light in organic channel waveguides

Takashi Kondo, Naoki Hashizume, Seiro Miyoshi, Ryuji Morita, Nagaatsu Ogasawara, Shinsuke Umegaki, Ryoichi Ito

Proceedings Volume 1337, (1990) https://doi.org/10.1117/12.22929

KEYWORDS: Channel waveguides, Second-harmonic generation, Crystals, Semiconductor lasers, Waveguides, Nonlinear crystals, Glasses, Organic materials, Planar waveguides, Cerenkov radiation imaging

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Showing 5 of 22 publications

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