Mr. Seiya Masuda Profile

Seiya Masuda

Operation Manager at FUJIFILM Electronic Materials Co Ltd

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 2 April 2007 Paper

The resist materials study for the outgassing reduction and LWR improvement in EUV lithography

Seiya Masuda, Sou Kamimura, Shuuji Hirano, Wataru Hoshino, Kazuyoshi Mizutani

Proceedings Volume 6519, 65191O (2007) https://doi.org/10.1117/12.711864

KEYWORDS: Polymers, Line width roughness, Extreme ultraviolet lithography, Surface roughness, Molecules, Radium, Extreme ultraviolet, Semiconducting wafers, Diffusion, Image segmentation

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Proceedings Article | 29 March 2006 Paper

The material design to reduce outgassing in acetal-based chemically amplified resist for EUV lithography

Seiya Masuda, Yasutomo Kawanishi, Shuuji Hirano, Sou Kamimura, Kazuyoshi Mizutani, Shoichiro Yasunami, Yasumasa Kawabe

Proceedings Volume 6153, 615342 (2006) https://doi.org/10.1117/12.656238

KEYWORDS: Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Molecules, Lithography, Chemically amplified resists, Semiconducting wafers, Optical lithography, Chemistry, EUV optics

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Proceedings Article | 14 May 2004 Paper

Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Seiya Masuda, Masakazu Kobayashi, Woo-Kyu Kim, Clement Anyadiegwu, Munirathna Padmanaban, Ralph Dammel, Keiichi Tanaka, Yoshiaki Yamada

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537409

KEYWORDS: Polymers, Finite element methods, Capillaries, Photoresist processing, Critical dimension metrology, Manufacturing, Semiconducting wafers, Lead, Temperature metrology, Optical resolution

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Proceedings Article | 24 July 2002 Paper

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Dalil Rahman, Eric Alemy, Will Conley, Daniel Miller, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Munirathna Padmanaban

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474210

KEYWORDS: Polymers, Lithography, Line edge roughness, Photomasks, Semiconducting wafers, Lithographic illumination, Photoresist processing, Binary data, Fourier transforms, Etching

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Proceedings Article | 24 July 2002 Paper

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Takanori Kudo, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Dalil Rahman, Andrew Romano, Munirathna Padmanaban, Jun-Sung Chun, Jae Chang Jung, Sung-Koo Lee, Ki-Soo Shin, Hyeong-Soo Kim

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474214

KEYWORDS: Photomasks, Polymers, Lithography, Binary data, Diffusion, Scanning electron microscopy, Halftones, Photoresist processing, Coherence (optics), Monochromatic aberrations

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Proceedings Article | 23 June 2000 Paper

Lithography and line-edge roughness of high-activation-energy resists

Seiya Masuda, Xiaoming Ma, G Noya, Georg Pawlowski

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388309

KEYWORDS: Line edge roughness, Polymers, Lithography, Standards development, Photoresist processing, Photoresist materials, Image processing, Inspection, Lithium, Picosecond phenomena

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Proceedings Article | 29 June 1998 Paper

Material design and lithographic performance of novel hydroxystyrene copolymer-based DUV negative resists

Takanori Kudo, Kayo Aramaki, Seiya Masuda, Georg Pawlowski

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312453

KEYWORDS: Polymers, Lithography, Deep ultraviolet, Photoresist processing, Silicon, Photomasks, Semiconducting wafers, Image processing, Head-mounted displays, Scanning electron microscopy

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Proceedings Article | 14 June 1996 Paper

Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

Satoru Funato, N. Kawasaki, Yoshiaki Kinoshita, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, T. Yamamoto, Georg Pawlowski

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241816

KEYWORDS: Deep ultraviolet, Polymers, Lithography, Chemically amplified resists, Photoresist processing, Silicon, Reflectivity, Diffusion, Annealing, Molecules

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Proceedings Article | 3 July 1995 Paper

Delay time stable chemically amplified e-beam negative tone resist for optical mask application

Seiya Masuda, Georg Pawlowski

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212768

KEYWORDS: Temperature metrology, Photomasks, Lithography, Optics manufacturing, Chemically amplified resists, Image processing, Manufacturing, Silicon, Scanning electron microscopy, Optical design

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Proceedings Article | 16 May 1994 Paper

Evaluation results for the positive deep UV resist AZ DX 46

Walter Spiess, Thomas Lynch, Charles Le Cornec, Gary Escher, Yoshiaki Kinoshita, John Kochan, Takanori Kudo, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Setha Olson, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Klaus Przybilla, Horst Roeschert, Natusmi Suehiro, Francoise Vinet, Horst Wengenroth

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175402

KEYWORDS: Scanning electron microscopy, Deep ultraviolet, Lithography, Excimer lasers, Semiconducting wafers, Surface conduction electron emitter displays, Photomasks, Krypton, Laser applications, Absorbance

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Proceedings Article | 16 May 1994 Paper

Structure-property relationship in acetal-based chemically amplified three-component DUV resist

Munirathna Padmanaban, Yoshiaki Kinoshita, Takanori Kudo, Thomas Lynch, Seiya Masuda, Yuko Nozaki, Hiroshi Okazaki, Georg Pawlowski, Klaus Przybilla, Horst Roeschert, Walter Spiess, Natusmi Suehiro, Horst Wengenroth

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175392

KEYWORDS: Deep ultraviolet, Lithography, Scanning electron microscopy, Polymers, Absorption, Etching, Semiconducting wafers, Silver, Photoresist materials, Clean room processes

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Proceedings Article | 15 September 1993 Paper

Delay-time stable chemically amplified deep-UV resist

Klaus Przybilla, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Horst Roeschert, Walter Spiess, Natusmi Suehiro

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154803

KEYWORDS: Diffusion, Deep ultraviolet, Lithography, Photoresist materials, Etching, Photoresist processing, Polymers, Contamination, Excimer lasers, Image resolution

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Proceedings Article | 15 September 1993 Paper

Delay-time effects between exposure and post-exposure bake in acetal-based deep-UV photoresists

Horst Roeschert, Charlotte Eckes, Hajime Endo, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Hiroshi Okazaki, Munirathna Padmanaban, Klaus Przybilla, Walter Spiess, Natusmi Suehiro, Horst Wengenroth, Georg Pawlowski

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154753

KEYWORDS: Photoresist materials, Semiconducting wafers, Polymers, Picture Archiving and Communication System, Lithography, Diffusion, Deep ultraviolet, Coating, Absorbance, Scanning electron microscopy

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Proceedings Article | 1 June 1992 Paper

Effect of humidity, residual solvent, and adventitious clean-room contaminants on the performance of AZ-PN

Munirathna Padmanaban, Hajime Endo, Yoshio Inoguchi, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Yasuhiro Nakajima, Georg Pawlowski

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59755

KEYWORDS: Humidity, Semiconducting wafers, Photoresist processing, Chemically amplified resists, Image processing, Diffusion, Nitrogen, Coating, Process control, Polymers

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Showing 5 of 14 publications

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