Seiya Masuda
Operation Manager at FUJIFILM Electronic Materials Co Ltd
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Image segmentation, Molecules, Diffusion, Surface roughness, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Radium

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Optical lithography, Polymers, Molecules, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Chemically amplified resists

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Capillaries, Manufacturing, Finite element methods, Optical resolution, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Temperature metrology, Lead

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Monochromatic aberrations, Coherence (optics), Polymers, Diffusion, Scanning electron microscopy, Photomasks, Halftones, Photoresist processing, Binary data

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Lithographic illumination, Etching, Polymers, Fourier transforms, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Binary data

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Lithium, Polymers, Image processing, Inspection, Photoresist materials, Picosecond phenomena, Line edge roughness, Photoresist processing, Standards development

Showing 5 of 14 publications
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