Senajith B. Rekawa
Engineering Manager at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Lithographic illumination, Mirrors, Fiber optic illuminators, Coherence (optics), Lenses, Extreme ultraviolet lithography, Lithography

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Coherence (optics), Reticles, Mirrors, Lithographic illumination, Coherence imaging, Optical proximity correction, Diffraction

Showing 5 of 32 publications
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