Senajith B. Rekawa
Engineering Manager at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanning electron microscopy, Photoresist materials, Projection systems, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Monochromatic aberrations, Optical design, Sensors, Interferometry, Wavefronts, Multiplexing, Optical alignment, Diffraction gratings, Shearing interferometers

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Microscopes, Mirrors, Lithographic illumination, Coherence (optics), Lenses, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Reticles, Lithographic illumination, Coherence (optics), Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Microscopes, Mirrors, Lenses, Coating, Reflectivity, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Fiber optic illuminators

SPIE Journal Paper | 14 March 2013
OE Vol. 52 Issue 03
KEYWORDS: Mirrors, Wavefronts, X-rays, Optical alignment, In situ metrology, X-ray optics, Optical testing, Charge-coupled devices, X-ray diffraction, Shearing interferometers

Showing 5 of 31 publications
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