Seok-Hwan Oh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (15)

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 79710K (2011)
KEYWORDS: Line width roughness, Scanning electron microscopy, Critical dimension metrology, Inspection, Photoresist materials, Image processing, Denoising, Semiconducting wafers, Data modeling, Metrology

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200R (2009)
KEYWORDS: Extreme ultraviolet lithography, Chromophores, Extreme ultraviolet, Lithography, Optical lithography, Optical transfer functions, Scanning electron microscopy, Electrons, Switches, Polymers

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 727339 (2009)
KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714032 (2008)
KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

Proceedings Article | 30 October 2007 Paper
Woosuk Shim, Sungsoo Suh, Frank Amoroso, Robert Lugg, Sooryung Lee, Sukjoo Lee, Seok-Hwan Oh, Junghyeon Lee, Tae-Hyuk Ahn, Chang-Jin Kang
Proceedings Volume 6730, 67302P (2007)
KEYWORDS: Optical proximity correction, SRAF, Photomasks, Data modeling, Semiconducting wafers, Lithography, Calibration, Process modeling, Printing, Inspection

Showing 5 of 15 publications
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