Seok-Hwan Oh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Data modeling, Image processing, Denoising, Inspection, Scanning electron microscopy, Photoresist materials, Line width roughness, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical transfer functions, Switches, Optical lithography, Polymers, Electrons, Scanning electron microscopy, Chromophores, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electronics, Optical lithography, Image compression, Polymers, Diffusion, Electroluminescence, Photoresist materials, Resolution enhancement technologies, Temperature metrology

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Reflectivity, Control systems, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Immersion lithography, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Process modeling

Showing 5 of 15 publications
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