Dr. Seok Han
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Sensors, Etching, Polymers, Silicon, Reflectivity, Control systems, Photoresist materials, Polymerization, Semiconducting wafers

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