Dr. Seok Han Profile

Dr. Seok Han

at Samsung Electronics Co Ltd

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Author

Publications (3)

Proceedings Article | 28 June 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Lee, Seok Han, Kyoung Park, Sangwoong Yoon, Hye Kang, Hyun Oh, Ji Lee, Young Kim, Tae Kim, Hye-Keun Oh

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617210

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Proceedings Article | 4 May 2005 Paper

New polymer platform of BARC for ArF lithography

Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki Nakajima, SangMun Chon, YoungHo Kim, Sangwoong Yoon, Seok Han, YoungHoon Kim, EunYoung Yoon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599421

KEYWORDS: Etching, Polymers, Lithography, Reflectivity, Semiconducting wafers, Silicon, Sensors, Polymerization, Control systems, Photoresist materials

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Proceedings Article | 4 May 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Ho Lee, Seok Han, Kyung Sil Park, Hye Young Kang, Hyun Wook Oh, Ji Eun Lee, Kyung Me Kim, Young Ho Kim, Tae Sung Kim, Hye-Keun Oh

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600308

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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