Seokkyun Kim
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Reticles, Optical parametric oscillators, Scanners, Distortion, Transmittance, Photomasks, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Reticles, Deep ultraviolet, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, EUV optics

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 6 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Optical lithography, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Silicon, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Ruthenium

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 17 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top