Mr. Seongbo Shim
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Data modeling, Etching, Metals, Image processing, Resistance, Computer simulations, 3D modeling, Artificial neural networks, Machine learning, Photoresist processing, Standards development, 3D image processing

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Optical lithography, Etching, Artificial neural networks, Neural networks, Machine learning, Optical proximity correction, Critical dimension metrology, Geometrical optics

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Metals, Raster graphics, Bessel functions

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Polymers, Photomasks, Machine learning, Directed self assembly, Optical proximity correction, Electrical engineering, Global Positioning System, 193nm lithography

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Semiconductors, Lithography, Metals, Fourier transforms, Image classification, Double patterning technology, Raster graphics, Electrical engineering, Vector spaces, Tolerancing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beams, Error analysis, Monte Carlo methods, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers

Showing 5 of 13 publications
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