Prof. Seong-Sue Kim
Professor at Seoul National University
SPIE Involvement:
Conference Chair | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editor | Author
Area of Expertise:
EUV Lithography , EUV Source , EUV Blank , EUV Mask , Optics of EUV , EUV Mask Infra
Publications (35)

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017)
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560I (2014)
KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482V (2014)
KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

Proceedings Article | 17 April 2014 Paper
Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 9048, 90480J (2014)
KEYWORDS: Ruthenium, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Photomasks, Silica, Scanning electron microscopy, Annealing, Oxygen

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482D (2014)
KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

Showing 5 of 35 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 4 December 2023

Conference Committee Involvement (14)
Photomask Technology 2024
29 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 14 Conference Committees
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top