Dr. Seong-Sue Kim
Master at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (35)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Oxides, Interfaces, Silicon, Oxygen, Finite element methods, Photomasks, Extreme ultraviolet, Neodymium, Ruthenium, Oxidation

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Carbon, Lithography, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Etching, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Silica, Ultraviolet radiation, Annealing, Oxygen, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Thin films, Lithography, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

Showing 5 of 35 publications
Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography XI
23 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Showing 5 of 11 published special sections
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