Dr. Seong-Woon Choi
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (117)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Principal component analysis, Data modeling, Calibration, Logic devices, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Statistical modeling, Model-based design

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Mathematical modeling, 3D acquisition, Image processing, Image quality, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers, Binary data, 3D image processing

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Data modeling, Calibration, Computer simulations, Image quality, Signal processing, Photomasks, Optical proximity correction, Nanoimprint lithography, System on a chip

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Cadmium, Data modeling, Error analysis, Photomasks, Artificial intelligence, Optical proximity correction, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Laser metrology

Showing 5 of 117 publications
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