Mr. Seong-Yong Moon Profile

Seong-Yong Moon

SVP at FST-Fine Semitech Co Ltd

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 14 October 2020 Poster + Presentation + Paper

Study on the multi layers for EUV pellicle

Sang Jin Cho, Kyoungwon Seo, Kyoungsoo Kim, Lan Yu, Seong-yong Moon

Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020

KEYWORDS: Semiconductors, Pellicles, Atomic layer deposition, Transmittance, Extreme ultraviolet

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Proceedings Article | 9 September 2013 Paper

Mask automation: need a revolution in mask makers and equipment industry

Seong-yong Moon, Sang-yong Yu, Young-hwa Noh, Ki-jung Son, Hyun-Joo Lee, Han-Ku Cho

Proc. SPIE. 8880, Photomask Technology 2013

KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

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Proceedings Article | 8 November 2012 Paper

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, Jinho Ahn

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Semiconductors, Electron beams, Contamination, Data modeling, Calibration, Reliability, Photomasks, Associative arrays, Beam shaping, Vestigial sideband modulation

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Proceedings Article | 11 May 2009 Paper

The novel plasma etching process for defect reduction in photomask fabrication

Ji-Hyun Lee, Il-Yong Jang, Yu Suk Jeong, Byounghoon Seung, Seong-Yong Moon, Sang-Gyun Woo, Han Ku Cho

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Etching, Particles, Dielectrics, Chromium, Photomasks, Aluminum, Plasma etching, Chlorine, Fluorine, Plasma

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Proceedings Article | 17 October 2008 Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Diffractive optical elements, Image processing, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Factor analysis

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Proceedings Article | 17 October 2008 Paper

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

Il-Yong Jang, Sung-Min Huh, Seong-Yong Moon, Sang-Gyun Woo, Jin-Kwan Lee, Sang Heup Moon, HanKu Cho

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Oxides, Optical properties, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Semiconducting wafers, Plasma

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Proceedings Article | 9 November 2005 Paper

Analysis of various blur effects on mask CD distortion

Hak-Seung Han, Sang-Hee Lee, Byung-Gook Kim, Seong-Yong Moon, Sung Woon Choi, Woo-Sung Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Electron beam lithography, Backscatter, Scattering, Electrons, Laser scattering, Distortion, Photomasks, Critical dimension metrology, Photoresist processing

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Proceedings Article | 9 November 2005 Paper

Improved modeling of fogging and loading effect correction

Sanghee Lee, Byunggook Kim, Hakseung Han, Dongseok Nam, Seongyong Moon, Seongwoon Choi, Woosung Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Electron beams, Data modeling, Modulation, Backscatter, Etching, Dry etching, Photomasks, Critical dimension metrology, System on a chip

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Proceedings Article | 8 November 2005 Paper

How large MEEF is acceptable for the low-k₁ lithography?

Dongseok Nam, Dong-Gun Lee, Byunggook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Semiconductors, Lithography, Optical testing, Scanning electron microscopy, Data processing, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers, Tolerancing

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Proceedings Article | 5 November 2005 Paper

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Il-Yong Jang, Young-Ju Park, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Etching, Dry etching, Particles, Chemistry, Manufacturing, Chromium, Photomasks, Reactive ion etching, Chlorine, Plasma

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Proceedings Article | 28 June 2005 Paper

Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Won-Suk Ahn, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Wafer-level optics, Lithography, Etching, Quartz, Dry etching, Chemistry, Photomasks, Nanoimprint lithography, Fluorine, Semiconducting wafers

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Proceedings Article | 28 June 2005 Paper

Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Sook-Kyeong Kim, Byung-Gook Kim, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Modulation, Etching, Manufacturing, Control systems, Photomasks, Beam shaping, Raster graphics, Photoresist processing, Vestigial sideband modulation, Chemically amplified resists

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Proceedings Article | 10 May 2005 Paper

Repair simulation with image processing and artificial intelligence

Yo-Han Choi, Moon-Kyu Sung, Sang-Hyun Lee, Ji-Hyung Lee, Jin-Hong Park, Ji-Hyun Choi, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Edge detection, Quartz, Image segmentation, Image processing, Inspection, Neural networks, Photomasks, Optical simulations, Artificial intelligence, Neurons

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Proceedings Article | 6 December 2004 Paper

Quantitative analysis of develop loading effect and its application

Hak-Seung Han, Se-Gun Moon, Je-Bum Yoon, Byung-Gook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Semiconductors, Electron beam lithography, Fluctuations and noise, Quantitative analysis, Photomasks, Chemical analysis, Critical dimension metrology, Data conversion, Photoresist processing, Tolerancing

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Proceedings Article | 20 August 2004 Paper

Analysis of mask CD error by dose modulation for fogging effect

Hojune Lee, Seung-Hune Yang, Byung-Gook Kim, Sung-Yong Moon, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Electron beams, Modulation, Error analysis, Laser scattering, Optical testing, Monte Carlo methods, Photomasks, Optical simulations, Critical dimension metrology, Systems modeling

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Proceedings Article | 17 December 2003 Paper

New method for approaching the loading-free process for photomask Cr etching

Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Etching, Dry etching, Manufacturing, Chromium, Oxygen, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Chlorine

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Proceedings Article | 17 December 2003 Paper

Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Hojune Lee, Seung-Hune Yang, Jin-Hong Park, Seong-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Cadmium, Modulation, Scattering, Etching, Dry etching, Error analysis, Monte Carlo methods, Photomasks, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Seong-Yong Moon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Quartz, Dry etching, Particles, Manufacturing, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Defect inspection

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Proceedings Article | 27 December 2002 Paper

PSM defect printability of extremely low-k1 sub-130-nm KrF lithography

Won-Il Cho, Gisung Yeo, Seong-Yong Moon, Hee-Sun Yoon, Jung-Min Sohn

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Lithographic illumination, Defect detection, Inspection, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Mask considerations for manufacturing assist features

Ji-Hyeon Choi, Won-Il Cho, Byeongsoo Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Defect detection, Manufacturing, Inspection, Transmittance, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Phase shifts

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Proceedings Article | 5 September 2001 Paper

Application of chemically amplified resist to 10-keV e-beam system

Sung-Hee Ahn, Chang-Hwan Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Lithography, Electron beam lithography, Fluctuations and noise, Scattering, Etching, Chromium, Scanning electron microscopy, Photomasks, Mask making, Chemically amplified resists

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Proceedings Article | 5 September 2001 Paper

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Chang-Hwan Kim, Jeong-Yun Lee, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Data modeling, Scattering, Etching, Dry etching, Diffusion, Chromium, Photomasks, Critical dimension metrology, Photoresist processing, Instrument modeling

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Proceedings Article | 22 January 2001 Paper

Effect of beam blur in mask fabrication

Seung-Hune Yang, Won-Tai Ki, Seong-Yong Moon, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beams, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Beam shaping, Convolution, Mask making, Critical dimension metrology, Photoresist processing, Beam analyzers

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Proceedings Article | 22 January 2001 Paper

Analysis of photomask distortion caused by blank materials and open ratios

Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Dry etching, Scanners, Error analysis, Chromium, Distortion, Printing, Photomasks, Semiconducting wafers, Overlay metrology

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SPIE Journal Paper | 1 November 2000

Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application

Eunah Kim, Seong-Yong Moon, Yong-Hoon Kim, Hee-Sun Yoon, Kwangsoo No

OE Vol. 39 Issue 11

KEYWORDS: Transmittance, Chromium, Phase shifts, Refractive index, Inspection, Photomasks, Etching, Phase shifting, Aluminum, Optical testing

Proceedings Article | 19 July 2000 Paper

Dose latitude dependency on resist contrast in e-beam mask lithography

Byung-Cheol Cha, Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII

KEYWORDS: Lithography, Electron beam lithography, Gaussian beams, Scattering, Etching, Dry etching, Photomasks, Beam shaping, Critical dimension metrology, Photoresist processing

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Proceedings Article | 30 December 1999 Paper

Simulation study and fabrication of high-transmittance attenuated phase-shifting mask

Eunah Kim, Seungbum Hong, Seong-Yong Moon, Yong-Hoon Kim, Hee-Sun Yoon, Kwangsoo No

Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology

KEYWORDS: Refractive index, Phase shifting, Inspection, Chromium, Optical testing, Transmittance, Photomasks, Photoresist developing, Device simulation, Phase shifts

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Proceedings Article | 30 December 1999 Paper

Analysis of photomask CD errors depending on development methods

Seong-Yong Moon, Won-Tai Ki, Byung-Cheol Cha, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology

KEYWORDS: Semiconductors, Lithography, Electronics, Optical lithography, Scattering, Error analysis, Coating, Photomasks, Critical dimension metrology, Liquids

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Proceedings Article | 8 December 1995 Paper

Shifter slope variation effect of embedded half-tone phase-shift masks

Jongwook Kye, Seong-Yong Moon, Sang-Gyun Woo, Woo-Sung Han, Young-Bum Koh

Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Lithography, Phase shifting, Image processing, Scanning electron microscopy, Transmittance, Photomasks, Mask making, Binary data, 3D image processing, Phase shifts

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Proceedings Article | 26 May 1995 Paper

Fidelity comparison of island patterns with different types of illuminations and phase shift masks

Seong-Yong Moon, Woo-Sung Han, Sang-Gyun Woo, Chang-Jin Sohn, Chul Hong Kim, Young-Bum Koh, Moon-Yong Lee

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Lithography, Lithographic illumination, Etching, Quartz, Scanning electron microscopy, Transmittance, Photomasks, Semiconducting wafers, Tolerancing, Phase shifts

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Showing 5 of 30 publications

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