Seongchul Hong
at Hanyang Univ
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Refractive index, Optical properties, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Stochastic processes

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Molybdenum, Stochastic processes, Phase shifts

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