We present a new fabrication method to grow vertically aligned nanowire arrays on a silicon substrate using
commercially available anodized aluminum oxide (AAO) and polycarbonate (PC) templates. This technique eliminates
the preparation procedure of coating one side of the template with a conductive layer, which is required in most template
assisted nanowire growth methods. In this study, vertically aligned nanowires with a high aspect ratio of over 10 were
fabricated on silicon substrate by electrodeposition, potentially enabling mass production.